US Patent 7427541 - CNT energy well FET
http://www.freepatentsonline.com/7427541.html
This patent from Intel teaches a method of forming a carbon nanotube transistor with less leakage current. Claim 1 reads:
1. A method, comprising:
creating a structure to form an energy well within a Carbon nanotube by placing a Carbon nanotube on a doped semiconductor region;
forming an undoped semiconductor region over said Carbon nanotube; and
delta doping said undoped semiconductor region above a first portion of said Carbon nanotube.
This patent from Intel teaches a method of forming a carbon nanotube transistor with less leakage current. Claim 1 reads:
1. A method, comprising:
creating a structure to form an energy well within a Carbon nanotube by placing a Carbon nanotube on a doped semiconductor region;
forming an undoped semiconductor region over said Carbon nanotube; and
delta doping said undoped semiconductor region above a first portion of said Carbon nanotube.
Labels: Intel
<< Home