Sunday, September 21, 2008

US Patent 7426067 - Atomic layer deposition on MEMS

This patent from the University of Colorodo teaches a method of coating a MEMS structure using atomic layer deposition which allows for the creation of nanometer scale layers adding propertes such as wear-resistance, electrical insulation, thermal conductivity, hydrophobicity, biocompatibility, and reflectivity to micromechanical structures. Claim 1 reads:

1. A method comprising:

providing a micro-mechanical device having dimensions smaller than one millimeter and a moving mechanical component; and

depositing at least one layer over of the micro-mechanical device by atomic layer deposition wherein said layer is deposited by sequentially exposing the micro-mechanical device to a first reactant and a second reactant, and said layer is a reaction product of the first and second reactant.