US Patent 7427328 - Nanowire solution deposition using electrostatic attraction
http://www.freepatentsonline.com/7427328.html
This patent from Nanosys teaches a system for applying a solution of nanowires to a substrate which can be used to form electronic devices on plastic or other flexible substrates. Claim 1 reads:
1. A system for applying nanowires to a target surface, comprising:
a solution source that provides a nanowire solution, wherein said nanowire solution comprises a liquid containing a plurality of nanowires, wherein the plurality of nanowires comprise silicon having an oxide coating and which have a first negative charge;
a nozzle coupled to said solution source, wherein said nozzle has at least one output opening; and
a target surface comprising a charged material having a second charge which is opposite to said first charge, which second charge aids in attracting the nanowires from the nanowire solution to the target surface;
wherein said nozzle directs the nanowire solution through said at least one output opening onto the target surface.
This patent from Nanosys teaches a system for applying a solution of nanowires to a substrate which can be used to form electronic devices on plastic or other flexible substrates. Claim 1 reads:
1. A system for applying nanowires to a target surface, comprising:
a solution source that provides a nanowire solution, wherein said nanowire solution comprises a liquid containing a plurality of nanowires, wherein the plurality of nanowires comprise silicon having an oxide coating and which have a first negative charge;
a nozzle coupled to said solution source, wherein said nozzle has at least one output opening; and
a target surface comprising a charged material having a second charge which is opposite to said first charge, which second charge aids in attracting the nanowires from the nanowire solution to the target surface;
wherein said nozzle directs the nanowire solution through said at least one output opening onto the target surface.
Labels: Nanosys
<< Home