US Patent 8048474 - Graphene memory resistance cell
http://www.freepatentsonline.com/8048474.html
In the past few years Sharp and Samsung have been developing new forms of high endurance non-volatile memory called RRAM based on metal oxide materials. This patent from SanDisk 3D teaches the manufacture of a new variation of RRAM based on graphene. Claim 1 reads:
1. A method of making a nonvolatile memory cell, comprising:
forming a steering element; and
forming a graphene storage element;
wherein the step of forming the graphene storage element comprises:
providing a graphene colloid; and
coating the graphene colloid over a substrate to form a graphene layer.
In the past few years Sharp and Samsung have been developing new forms of high endurance non-volatile memory called RRAM based on metal oxide materials. This patent from SanDisk 3D teaches the manufacture of a new variation of RRAM based on graphene. Claim 1 reads:
1. A method of making a nonvolatile memory cell, comprising:
forming a steering element; and
forming a graphene storage element;
wherein the step of forming the graphene storage element comprises:
providing a graphene colloid; and
coating the graphene colloid over a substrate to form a graphene layer.
Labels: SanDisk3D
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