US Patent 7955644 - Selective anchoring of nanoscale structures
http://www.freepatentsonline.com/7955644.html
This patent from the California Institute of Technology discloses a new method of patterning nanostructures such as carbon nanotubes on a substrate which may have use in fabricating field emission displays. Claim 1 reads:
1. A method for fastening a plurality of nanoscale structures within an anchoring layer, comprising acts of:
providing a first fluid layer on an anchoring substrate;
providing a plurality of nanostructures on a growth substrate on which the nanostructures were grown, the nanostructures each having a defined height and orientation with respect to the growth substrate; and
introducing the plurality of nanostructures to a desired depth in the first fluid layer, such that the orientation of the nanostructures relative to the growth substrate is substantially maintained.
This patent from the California Institute of Technology discloses a new method of patterning nanostructures such as carbon nanotubes on a substrate which may have use in fabricating field emission displays. Claim 1 reads:
1. A method for fastening a plurality of nanoscale structures within an anchoring layer, comprising acts of:
providing a first fluid layer on an anchoring substrate;
providing a plurality of nanostructures on a growth substrate on which the nanostructures were grown, the nanostructures each having a defined height and orientation with respect to the growth substrate; and
introducing the plurality of nanostructures to a desired depth in the first fluid layer, such that the orientation of the nanostructures relative to the growth substrate is substantially maintained.
Labels: Caltech
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