Thursday, December 30, 2010

US Patent 7858185 - High purity nanotube fabric

This latest patent from Nantero includes basic claims to purified carbon nanotube films capable of being integrated into CMOS semiconductor processes. Claim 1 reads:

1. A nanotube film comprising:

a solution-deposited network of connected and purified nanotubes on a substrate,

wherein the nanotubes form a film of substantially uniform porosity, the film is free of amorphous carbon, the film is free of polymer and surfactants, the film comprises less than about 1×1018 atoms/cm2 of metallic impurities, and the film is free of particle impurities having a diameter of greater than about 500 nm.