Monday, September 12, 2011

US Patent 8011296 - Supercritical fluid assisted printing of nanoparticles

This patent from Micron Technology discloses a high throughput deposition method for a pattern of nanoparticles using a maskless technique which does not require photolithography. Claim 1 reads:

1. A system for the maskless writing of a pattern on a substrate, comprising:

a support;

an unmasked substrate supported by the support;

a discharge assembly for masklessly discharging a solution directly to a surface of the unmasked substrate, the solution comprising nanometer-sized particles dissolved or dispersed in a supercritical fluid; and

a charging device for electrically charging the nanometer-sized particles.