US Patent 7971489 - CNT load cell
http://www.freepatentsonline.com/7971489.html
This patent from Applied Materials teaches a strain gauge formed using carbon nanotubes used in characterizing semiconductor wafers in environments having background EM noise. Claim 10 reads:
10. A test wafer assembly for characterizing semiconductor processing equipment, comprising:
a first wafer;
a second wafer, parallel to said first wafer;
a plurality of spaced-apart carbon nanotube load cells positioned between and attached to both of said first and second wafers; and
an electrical device, independently electrically connected to each of said plurality of carbon nanotube load cells;
wherein said electrical device is configured to monitor and record the resistivity of said load cells.
This patent from Applied Materials teaches a strain gauge formed using carbon nanotubes used in characterizing semiconductor wafers in environments having background EM noise. Claim 10 reads:
10. A test wafer assembly for characterizing semiconductor processing equipment, comprising:
a first wafer;
a second wafer, parallel to said first wafer;
a plurality of spaced-apart carbon nanotube load cells positioned between and attached to both of said first and second wafers; and
an electrical device, independently electrically connected to each of said plurality of carbon nanotube load cells;
wherein said electrical device is configured to monitor and record the resistivity of said load cells.
Labels: Applied Materials
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