US Patent 7932549 - CNT trench capacitors
http://www.freepatentsonline.com/7932549.html
DRAM is a form of volatile semiconductor memory able to achieve high density due to a simple structure of one transistor and one capacitor and is commonly used as a main memory in personal computers. This patent from IBM teaches a way to use carbon nanotubes to fabricate the capacitors of DRAM memory cells. Claim 1 reads:
1. A trench-type storage device comprising:
a substrate;
a trench in said substrate;
multiple conductive carbon nanotubes lining said trench; and
a trench conductor, surrounded by and in direct contact with said multiple conductive carbon nanotubes, filling said trench, wherein said trench conductor and said substrate have a co-planar top surface.
DRAM is a form of volatile semiconductor memory able to achieve high density due to a simple structure of one transistor and one capacitor and is commonly used as a main memory in personal computers. This patent from IBM teaches a way to use carbon nanotubes to fabricate the capacitors of DRAM memory cells. Claim 1 reads:
1. A trench-type storage device comprising:
a substrate;
a trench in said substrate;
multiple conductive carbon nanotubes lining said trench; and
a trench conductor, surrounded by and in direct contact with said multiple conductive carbon nanotubes, filling said trench, wherein said trench conductor and said substrate have a co-planar top surface.
Labels: IBM
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