US Patent 7767261 - Passivation of semiconductor nanoparticles
http://ip.com/patent/US7767261
Kovio is a Silicon Valley company founded in the MIT Media Lab. focusing on the development of printing silicon over flexible and large area substrates. This latest patent has priority going back to 2003 and teaches a passivation method for silicon nanoparticle "ink". Claim 1 reads:
1. A method of making passivated semiconductor nanoparticles, comprising:
a) reacting hydrogen-terminated semiconductor nanoparticles with a compound containing one or more unsaturated carbon-carbon bond(s) to form said passivated semiconductor nanoparticles; and
b) isolating said passivated semiconductor nanoparticles.
Kovio is a Silicon Valley company founded in the MIT Media Lab. focusing on the development of printing silicon over flexible and large area substrates. This latest patent has priority going back to 2003 and teaches a passivation method for silicon nanoparticle "ink". Claim 1 reads:
1. A method of making passivated semiconductor nanoparticles, comprising:
a) reacting hydrogen-terminated semiconductor nanoparticles with a compound containing one or more unsaturated carbon-carbon bond(s) to form said passivated semiconductor nanoparticles; and
b) isolating said passivated semiconductor nanoparticles.
Labels: Kovio
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