US Patent 7303631 - ZnO nanowire array formed from patterned seed layer
http://www.freepatentsonline.com/7303631.html
One method of forming nanostructures is vapor-liquid-solid (VLS)growth which involve the use of catalytic particles such as gold. However, these particles are not easy to pattern and difficult to work with in ultraclean environment. This patent from Sharp offers an alternative for selectively patterned growth of zinc oxide nanostructures using atomic layer deposition of polycrystalline zinc oxide. Claim 1 reads:
1. A method of forming a zinc-oxide nanostructure, comprising: providing a substrate; forming a seed layer of polycrystalline zinc oxide on a surface of the substrate; patterning the seed layer; inducing growth of at least one zinc-oxide nanostructure substantially over the patterned seed layer.
One method of forming nanostructures is vapor-liquid-solid (VLS)growth which involve the use of catalytic particles such as gold. However, these particles are not easy to pattern and difficult to work with in ultraclean environment. This patent from Sharp offers an alternative for selectively patterned growth of zinc oxide nanostructures using atomic layer deposition of polycrystalline zinc oxide. Claim 1 reads:
1. A method of forming a zinc-oxide nanostructure, comprising: providing a substrate; forming a seed layer of polycrystalline zinc oxide on a surface of the substrate; patterning the seed layer; inducing growth of at least one zinc-oxide nanostructure substantially over the patterned seed layer.
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