Tuesday, June 05, 2012

US Patent 8192920 - Nanolithography using rotatable mask


This patent is from a company called Rolith Inc. which has developed a new form of high throughput large surface area nanolithography based on a rolling lithography mask. Claim 1 reads:

1. A lithography method, comprising:

a) depositing a self-assembled monolayer on substrate surface;

b) providing a rotatable mask having a shape of a cylinder or a cone and a nanopattem on an exterior surface of said rotatable mask;

c) contacting said nanopattem with said self-assembled monolayer;

d) distributing radiation through said nanopattem, while rotating said rotatable mask over said self-assembled monolayer,

whereby an image having a feature size less than 500 nm is created in said self-assembled monolayer.