US Patent 8143144 - Nanowire hetero-growth
http://www.freepatentsonline.com/8143144.html
This patent from Panasonic teaches a way to manufacture silicon nanowires having regions of different dopant concentration for thin film transistor used in flat-panel displays. Claim 1 reads:
1. A method for fabricating a semiconductor nanowire that has first and second regions, the method comprising:
putting a catalyst particle on a substrate;
growing the first region from the catalyst particle with a vapor-liquid-solid phase (VLS) grower;
forming a protective coating on a sidewall of the first region; and
growing the second region extending from the first region with the VLS grower.
This patent from Panasonic teaches a way to manufacture silicon nanowires having regions of different dopant concentration for thin film transistor used in flat-panel displays. Claim 1 reads:
1. A method for fabricating a semiconductor nanowire that has first and second regions, the method comprising:
putting a catalyst particle on a substrate;
growing the first region from the catalyst particle with a vapor-liquid-solid phase (VLS) grower;
forming a protective coating on a sidewall of the first region; and
growing the second region extending from the first region with the VLS grower.
Labels: Panasonic
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