US Patent 8136551 - CNT-based gas valve
http://www.freepatentsonline.com/8136551.html
For molecular and atomic layer deposition processes it is necessary to precisely control gas delivery at low concentrations and low pressures. This patent from Applied Materials teaches a carbon nanotube based valve structure to achieve this type of control. Claim 1 reads:
1. A valve for controlling flow of a gas, comprising:
a valve housing;
a block of aligned carbon nanotubes, said block and said valve housing being configured to direct said gas through the carbon nanotubes in said block; and
a device for applying a force to compress said block of aligned carbon nanotubes, wherein said block of aligned carbon nanotubes is compressed perpendicular to the walls of the carbon nanotubes in said block;
whereby the application of said force to said walls restricts the flow of said gas through said valve.
For molecular and atomic layer deposition processes it is necessary to precisely control gas delivery at low concentrations and low pressures. This patent from Applied Materials teaches a carbon nanotube based valve structure to achieve this type of control. Claim 1 reads:
1. A valve for controlling flow of a gas, comprising:
a valve housing;
a block of aligned carbon nanotubes, said block and said valve housing being configured to direct said gas through the carbon nanotubes in said block; and
a device for applying a force to compress said block of aligned carbon nanotubes, wherein said block of aligned carbon nanotubes is compressed perpendicular to the walls of the carbon nanotubes in said block;
whereby the application of said force to said walls restricts the flow of said gas through said valve.
Labels: Applied Materials
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