US Patent 8101980 - Embedded gate graphene transistor
http://www.freepatentsonline.com/8101980.html
This patent from Samsung teaches a simplified method for manufacturing graphene nano-ribbon transistors. Claim 1 reads:
1. A graphene device comprising:
at least one embedded gate on a substrate;
an upper oxide layer on the at least one embedded gate; and
a graphene channel and a plurality of electrodes on the upper oxide layer, the plurality of electrodes including a source electrode and a drain electrode,
wherein the at least one embedded gate does not overlap with the source electrode and the drain electrode.
This patent from Samsung teaches a simplified method for manufacturing graphene nano-ribbon transistors. Claim 1 reads:
1. A graphene device comprising:
at least one embedded gate on a substrate;
an upper oxide layer on the at least one embedded gate; and
a graphene channel and a plurality of electrodes on the upper oxide layer, the plurality of electrodes including a source electrode and a drain electrode,
wherein the at least one embedded gate does not overlap with the source electrode and the drain electrode.
Labels: Samsung
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