US Patent 7682970 - Laser ablation nanopatterning
http://www.freepatentsonline.com/7682970.html
This patent from the University of California teaches a maskless fabrication method for organic field effect transistors having <100nm resolution by using laser ablation. Claim 1 reads:
1. A method of forming a nanostructure comprising:
depositing a suspension containing nanoparticles onto a substrate forming thereby a pattern;
ablating said pattern to produce an ablated pattern; and
sintering said ablated pattern to produce said nanostructure.
This patent from the University of California teaches a maskless fabrication method for organic field effect transistors having <100nm resolution by using laser ablation. Claim 1 reads:
1. A method of forming a nanostructure comprising:
depositing a suspension containing nanoparticles onto a substrate forming thereby a pattern;
ablating said pattern to produce an ablated pattern; and
sintering said ablated pattern to produce said nanostructure.
Labels: University of California
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