Sunday, March 28, 2010

US Patent 7682970 - Laser ablation nanopatterning

This patent from the University of California teaches a maskless fabrication method for organic field effect transistors having <100nm resolution by using laser ablation. Claim 1 reads:

1. A method of forming a nanostructure comprising:

depositing a suspension containing nanoparticles onto a substrate forming thereby a pattern;

ablating said pattern to produce an ablated pattern; and

sintering said ablated pattern to produce said nanostructure.