Sunday, March 28, 2010

US Patent 7682659 - Suspended carbon MEMS

MEMS devices are most often formed with silicon materials but for some applications carbon is more desirable to establish biocompatiblity. This patent from the University of California teaches a method for forming carbon MEMS of different shapes. Claim 1 reads:

1. A method for forming suspended carbon structures comprising the steps of

exposing a negative photoresist to UV light;

patterning lines with electron beam lithography to the top surface of the photoresist between UV exposed areas;

pyrolyzing the patterned negative photoresist in a two step pyrolysis process in a first inert gas atmosphere; and

forming carbon posts with carbon structures suspended therebetween.