Monday, November 09, 2009

US Patent 7613538 - Distortion compensation for nanoimprint lithography

This patent from HP teaches a quality control method for nanoimprint lithography based on choosing the mold design so as to minimize anticipated distortions. Claim 1 reads:

1. A method of contact lithography comprising:

predicting distortions likely to occur in transferring a pattern from a mold to a substrate during a contact lithography process; and

modifying said mold to compensate for said distortions.