US Patent 7608854 - Branched nanowire with diffusion doping
http://www.freepatentsonline.com/7608854.html
This patent from Hewlett Packard teaches a method to grow pn junction nanowire structures useful for the fabrication of bipolar and field effect transistors. Claim 1 reads:
1. An electronic device, comprising:
a primary nanowire of a first conductivity type;
a secondary nanowire of a second conductivity type grown from and extending outwardly in one direction from the primary nanowire; and
a doped region of the second conductivity type diffused from and extending from the secondary nanowire into at least a portion of the primary nanowire.
This patent from Hewlett Packard teaches a method to grow pn junction nanowire structures useful for the fabrication of bipolar and field effect transistors. Claim 1 reads:
1. An electronic device, comprising:
a primary nanowire of a first conductivity type;
a secondary nanowire of a second conductivity type grown from and extending outwardly in one direction from the primary nanowire; and
a doped region of the second conductivity type diffused from and extending from the secondary nanowire into at least a portion of the primary nanowire.
Labels: Hewlett Packard
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