Wednesday, October 07, 2009

US Patent 7597814 - Template for patterning nanoscale objects

Self-assembly is one type of a process used to generate template patterns from which nanoscale structures can be grown or deposited. However, it can be difficult to control the size and arrangement of the nanoscale structures using self-assembly methods alone. This patent from HP teaches using a nanoimprint mold to provide more control of the patterns used in nanoscale templates. Claim 1 reads:

1. A method of fabricating ordered patterns of nanoscale objects on a substrate surface comprising:

applying a resist layer to a substrate surface;

stamping an imprint mold having nanoscale teeth onto the resist layer;

releasing the imprint mold to expose a template having a template surface formed into the imprint resist layer and having nanoscale openings formed therein to receive nanoscale objects; and

depositing a plurality of discrete nanoscale objects onto the template such that the nanoscale objects are received within said nanoscale openings, said nanoscale objects are selected from the group consisting of nanoparticles, nanowires, nanorods, nanotubes, proteins, and DNA.