US Patent 7528060 - E-beam induced growth of branched nanostructures
http://www.freepatentsonline.com/7528060.html
This patent from the University of Puerto Rico teaches a new methodology for forming branched silicon nanostructures which may provide enhanced surface/volume ratios for higher efficiency sensors. Claim 1 reads:
1. A method of growing branched nanostructures comprising the steps of:
providing a porous substrate;
directing an electron beam at the porous substrate; and
growing a branched nanostructure from the porous substrate as a consequence of directing said electron beam at the porous substrate.
This patent from the University of Puerto Rico teaches a new methodology for forming branched silicon nanostructures which may provide enhanced surface/volume ratios for higher efficiency sensors. Claim 1 reads:
1. A method of growing branched nanostructures comprising the steps of:
providing a porous substrate;
directing an electron beam at the porous substrate; and
growing a branched nanostructure from the porous substrate as a consequence of directing said electron beam at the porous substrate.
Labels: University of Puerto Rico
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