Friday, September 05, 2008

US Patent 7419764 - Nanoimprint mold fabrication using E-beam+photolihography

In order to achieve sub-100 nm processing in coming years one alternative is nanoimprint lithography. Nanoimprint lithography uses a mold to transfer a pattern onto an opposing substrate. This patent from S. Korea's Electronics and Telecommunications Research Institute teaches a method for forming a nanoimprint mold using photolithography to form the larger (>100nm) features and E-beam lithography to form the nanoscopic (<100nm) surface features. Claim 1 reads:

1. A method of fabricating a nanoimprint lithography (NHL) mold comprising:

forming patterns on a first substrate using an E-beam lithography (EBL) process and a photo-lithography process; and

transferring the patterns formed on the first substrate to a second substrate using a nanoimprint lithography process to complete an NIL mold.