US Patent 7416993 - Nanowire fabric patterning
http://www.freepatentsonline.com/7416993.html
has focused most of their patents on nanomechanical switches formed from carbon nanotube fabrics. This patent extends the scope of their nanofabric technology to cover other possible nanowire based patterning. Claim 1 reads:
1. A method of making a conductive article on a substrate, comprising:
forming a nanowire fabric on the substrate;
defining the nanowire fabric to have a pattern; and
forming a strapping layer that contacts at least a longitudinally-extending portion of the nanowire fabric.
has focused most of their patents on nanomechanical switches formed from carbon nanotube fabrics. This patent extends the scope of their nanofabric technology to cover other possible nanowire based patterning. Claim 1 reads:
1. A method of making a conductive article on a substrate, comprising:
forming a nanowire fabric on the substrate;
defining the nanowire fabric to have a pattern; and
forming a strapping layer that contacts at least a longitudinally-extending portion of the nanowire fabric.
Labels: Nantero
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