Tuesday, June 19, 2007

US Patent 7232771 - Flexible electrostatic nanoimprint stamp


This patent is directed to a new type of nanoimprint lithography employing electrostatic charging to transfer nanoparticle patterns onto a substrate. Although it is not the first patent to use electrostatic transfer in an imprint lithography system (see US Patent 7223444) it adds the feature of a flexible substrate as the stamp structure. Claim 1 reads:

1. A method of depositing nanoparticles on a substrate, comprising: obtaining a flexible stamp having a pattern formed thereon, the flexible stamp including a flexible overlayer of semiconductor material forming the pattern; applying the flexible stamp to the substrate to form a charge pattern on the substrate; and depositing nanoparticles on the charged pattern on the substrate.