Friday, March 16, 2007

US Patent 7190049 - Vertical nanowire array in polymer matrix

Co-polymer self-assembly is frequently being used to create templates to form large arrays of nanostructures on a substrate. This patent from the University of Massachusetts uses co-polymer self assembly to produce ultrahigh density nanowire arrays with high magnetic coercivity for magnetic storage applications. Claim 1 reads:

1. A nanoscale array comprising an electrically-conductive substrate and nanowires arranged in parallel on the substrate, the nanowires each having a diameter of 1.0 to 100 nanometers, and having a periodicity of 1.0 to 100 nanometers; and a polymer matrix between the nanowires, wherein the substrate is a metal substrate.

Labels: , ,