US Patent 7190049 - Vertical nanowire array in polymer matrix
http://www.freepatentsonline.com/7190049.pdf
Co-polymer self-assembly is frequently being used to create templates to form large arrays of nanostructures on a substrate. This patent from the University of Massachusetts uses co-polymer self assembly to produce ultrahigh density nanowire arrays with high magnetic coercivity for magnetic storage applications. Claim 1 reads:
1. A nanoscale array comprising an electrically-conductive substrate and nanowires arranged in parallel on the substrate, the nanowires each having a diameter of 1.0 to 100 nanometers, and having a periodicity of 1.0 to 100 nanometers; and a polymer matrix between the nanowires, wherein the substrate is a metal substrate.
Co-polymer self-assembly is frequently being used to create templates to form large arrays of nanostructures on a substrate. This patent from the University of Massachusetts uses co-polymer self assembly to produce ultrahigh density nanowire arrays with high magnetic coercivity for magnetic storage applications. Claim 1 reads:
1. A nanoscale array comprising an electrically-conductive substrate and nanowires arranged in parallel on the substrate, the nanowires each having a diameter of 1.0 to 100 nanometers, and having a periodicity of 1.0 to 100 nanometers; and a polymer matrix between the nanowires, wherein the substrate is a metal substrate.
Labels: memory, nanowire, self-assembly
posted by blaisemouttet at 12:41 PM
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