Tuesday, January 30, 2007

US Patent 7169989 - Etching Using Nanopipette


Typically etching is a batch process in which a reactive gas or liquid dissolves away material from a substrate in order to complete a microfabrication step. However, this patent proposes a more precise, albeit slower, etching method that employs a nano-sized nozzle to deliver the etching chemical.

1. A process for introducing a three-dimensional configuration of micron to sub-micron size in a polymeric substrate comprising applying an enzyme for the selective removal of sub-unit parts of the polymer to at least one predetermined area of said polymeric substrate via a pipette with a nano-sized orifice.