Tuesday, January 30, 2007

US Patent 7169251 - Nanofluidic Channel Fabrication


Typically forming a structure in the nanoscale that is well known to be formed in the microscale is arguably obvious. However, the attorney prosecuting this patent from the Univ. of Michigan successfully argued the non-obviousness of this method of manufacturing a nanofluidic flow passage when the microfluidic version was known. Claim 1 reads:

1. A method of forming enclosed nanofluidic channels, said method comprising: providing a first substrate having a layer of a first material thereon; providing a second substrate; forming a slot of nanoscale depth along said second substrate, said slot being formed by nanolithography and etching; and bonding said first substrate to said second substrate such that said layer of said first material on said first substrate is adjacent said slot on said second substrate to define an enclosed nanofluidic channel therethrough.

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