US Patent 7985454 - Low cost nanowire growth
http://www.freepatentsonline.com/7985454.html
This latest patent from Nanosys teaches a method which may bring mass production of nanowire devices closer to the mainstream. Claim 1 reads:
1. A method to produce a catalytic-coated nanowire growth substrate for nanowire growth, comprising:
(a) depositing a buffer layer on a substrate;
(b) treating the buffer layer with boiled water or steam following the depositing in step (a) to enhance interactions between the buffer layer and catalyst particles; and
(c) depositing catalytic particles on a surface of the buffer layer following the treating in step (b).
This latest patent from Nanosys teaches a method which may bring mass production of nanowire devices closer to the mainstream. Claim 1 reads:
1. A method to produce a catalytic-coated nanowire growth substrate for nanowire growth, comprising:
(a) depositing a buffer layer on a substrate;
(b) treating the buffer layer with boiled water or steam following the depositing in step (a) to enhance interactions between the buffer layer and catalyst particles; and
(c) depositing catalytic particles on a surface of the buffer layer following the treating in step (b).
Labels: Nanosys
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