US Patent 7893495 - Zinc oxide nanodisk FET
http://www.freepatentsonline.com/7893495.html
Zinc oxide has been used as a channel material for thin film transistors but has low electron mobility. This patent teaches fabricating zinc oxide nanodisks which can improve the mobility. Claim 1 reads:
1. A thin film transistor, comprising:
a substrate;
a gate electrode a source electrode and a drain electrode;
a dielectric layer; and
a semiconductor layer;
wherein the semiconductor layer comprises zinc oxide nanodisks oriented with their c-axis perpendicular to the dielectric layer or the substrate; and
wherein the zinc oxide nanodisks have a height of from about 1 nanometer to about 100 nanometers.
Zinc oxide has been used as a channel material for thin film transistors but has low electron mobility. This patent teaches fabricating zinc oxide nanodisks which can improve the mobility. Claim 1 reads:
1. A thin film transistor, comprising:
a substrate;
a gate electrode a source electrode and a drain electrode;
a dielectric layer; and
a semiconductor layer;
wherein the semiconductor layer comprises zinc oxide nanodisks oriented with their c-axis perpendicular to the dielectric layer or the substrate; and
wherein the zinc oxide nanodisks have a height of from about 1 nanometer to about 100 nanometers.
Labels: Xerox
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