Thursday, October 14, 2010

US Patent 7811635 - Nanoink with inorganic precursor

This latest patent from the founders of NanoInk (priority 2001) broadly covers the deposition of reactive sol-gel "inks" used in their Dip Pen Nanolithography(R) process. Claim 1 reads:

1. A method of fabricating inorganic/organic nanostructures comprising depositing an ink on a substrate by direct write nanolithography with a tip to form a deposit, wherein the ink comprises an inorganic precursor and at least one organic polymer.

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