US Patent 7744956 - CNT patterning to eliminate shielding effects
http://www.freepatentsonline.com/7744956.html
High efficiency electron emitters may be manufactured by growing arrays of carbon nanotubes in a high density however there is an ultimate limit to the efficiency determined by a screening effect in which electrostatic repulsion effects come into play when the array density is too high. This patent from Hon Hai Precision teaches a way around this problem based on a patterned segmentation within the nanotube arrays. Claim 1 reads:
1. A method for forming a patterned array of carbon nanotubes, the method comprising the steps of:
(a) forming an array of carbon nanotubes on a substrate; and
(b) exerting a pressure on the array of carbon nanotubes by a molding device having a pattern to imprint the array of carbon nanotubes to obtain the patterned array of carbon nanotubes;
wherein the molding device is a metal wire mesh.
High efficiency electron emitters may be manufactured by growing arrays of carbon nanotubes in a high density however there is an ultimate limit to the efficiency determined by a screening effect in which electrostatic repulsion effects come into play when the array density is too high. This patent from Hon Hai Precision teaches a way around this problem based on a patterned segmentation within the nanotube arrays. Claim 1 reads:
1. A method for forming a patterned array of carbon nanotubes, the method comprising the steps of:
(a) forming an array of carbon nanotubes on a substrate; and
(b) exerting a pressure on the array of carbon nanotubes by a molding device having a pattern to imprint the array of carbon nanotubes to obtain the patterned array of carbon nanotubes;
wherein the molding device is a metal wire mesh.
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