Thursday, April 22, 2010

US Patent 7701668 - Nanodisk memory formed via imprint lithography

This patent from ASML Holding NV teaches using naoimprint lithography to pattern sub-50nm bit patterns on a memory disk. Claim 11 reads:

11. A method of manufacturing a memory disk, comprising:

(a) forming main tracks on a disk platen by imprinting a nanodisk onto the disk platen;

(b) forming isolated bit areas with respect to the main tracks on the disk platen by imprinting the nanodisk onto the disk platen; and

(c) forming a magnetic layer on the isolated bit areas with magnetic material to form discrete isolated data bits.