US Patent 7282456 - Repair of nanostructures using guiding structure

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One of the problems with many of the proposals of nanoelectronic devices is that the nanowires and similar structures used to form the devices are subject to some degree of defects which must be compensated for by the architecture design. This patent from Princeton University teaches a method of reducing such defects in nanoscale structures by a process somewhat analogous to annealing. One of the key insights was the inclusion of a guiding surface which controls the nanostructure height leading to high aspect ratios. Claim 1 reads:

1. A method of reducing geometrical and/or structural defects in a nanoscale device having at least one nanostructure with a minimum dimension about one micrometer or less comprising the steps of: providing the nanoscale device; placing a guiding surface adjacent an exposed surface of the nanostructure; liquifying the nanostructure for a period of time; and permitting the liquified nanostructure to resolidify.