US Patent 7183122 - Scanning probe sub-surface circuit modification
http://www.freepatentsonline.com/7183122.pdf
Scanning tunneling microscopes and atomic force microscopes were fundamental innovations developed in the 1980's to detect on the nanoscale. More recently these devices (collectively referred to as scanning probe microscopes) have been applied to nanofabrication processes such as etching and coating as well as detection. This patent from Intel has basic claims to subsurface circuit processing using these tools. Claim 1 reads:
1. A method comprising: machining a hole on an integrated circuit with a scanning probe system; and performing a circuit edit through the hole formed by said system.
Scanning tunneling microscopes and atomic force microscopes were fundamental innovations developed in the 1980's to detect on the nanoscale. More recently these devices (collectively referred to as scanning probe microscopes) have been applied to nanofabrication processes such as etching and coating as well as detection. This patent from Intel has basic claims to subsurface circuit processing using these tools. Claim 1 reads:
1. A method comprising: machining a hole on an integrated circuit with a scanning probe system; and performing a circuit edit through the hole formed by said system.
Labels: Intel, scanning probe microscope
posted by blaisemouttet at 9:31 AM
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