US Patent 8212237 - Surrounding gate nanowire flash memory
http://www.freepatentsonline.com/8212237.html
This patent from QuNano teaches a charge trap based memory which help reduce the footprint of flash memory cells while allowing vertical stacking for 3D memory. Claim 1 reads:
1. A nanostructured memory device comprising:
at least one semiconductor nanowire forming a current transport channel;
one or more shell layers arranged around at least a portion of the nanowire;
nano-sized charge trapping centres embedded in said one or more shell layers, wherein a change in an amount of charge stored in one or more of the charge trapping centres alters the conductivity of the nanowire; and
at least a first gate electrode arranged around at least a portion of said one or more shell layers in order to control the amount of charge stored in the charge trapping centres under the gate electrode;
wherein said one or more shell layers are made of materials having different band gap in order to give a graded or crested band profile.
This patent from QuNano teaches a charge trap based memory which help reduce the footprint of flash memory cells while allowing vertical stacking for 3D memory. Claim 1 reads:
1. A nanostructured memory device comprising:
at least one semiconductor nanowire forming a current transport channel;
one or more shell layers arranged around at least a portion of the nanowire;
nano-sized charge trapping centres embedded in said one or more shell layers, wherein a change in an amount of charge stored in one or more of the charge trapping centres alters the conductivity of the nanowire; and
at least a first gate electrode arranged around at least a portion of said one or more shell layers in order to control the amount of charge stored in the charge trapping centres under the gate electrode;
wherein said one or more shell layers are made of materials having different band gap in order to give a graded or crested band profile.
Labels: QuNano
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