Thursday, December 22, 2011

US Patent 8080441 - Forming graphene sheets from photoresist

Photoresists are materials having light sensitive properties used in patterning semiconductor and wiring patterns on a substrate. This patent from Cree, Inc. includes some basic claims to a method of forming graphene sheets on a substrate from a photoresist layer. Claim 1 reads:

1. A method of forming a polygonal carbon layer, the method comprising:

providing a photoresist layer on a substrate; and

energizing the photoresist layer until the photoresist layer forms graphene or a graphene-like sheet.