Thursday, December 17, 2009

US Patent 7633080 - Nanofabrication via DNA functionalization

This patent from Intel teaches one method to overcome the limitations of conventional lithography by using DNA in patterning nanomaterials. Claim 1 reads:

1. A nano-structure device comprising:

an array of functionalized nano-building blocks comprising:

an array of columns of functionalized nano-building blocks coupled together, wherein each of the columns of the nano-structure device are positioned in the same pattern and relative location as each electrode of an array of individually addressable electrodes positioned on an assembly platform used to form the nano-structure device.