US Patent 7078276 - Fabrication Using Nanoparticle Ink Annealing
http://www.freepatentsonline.com/7078276.pdf
Use of nanoparticle based ink is an attractive low-cost alternative to optical lithographic processes since it only requires printing methodologies such as inkjet or imprint lithography which present fewer environmental constraints. This patent proposes using annealing of a deposited nanoparticle ink layer in a metal oxide matrix to form doped surface layers for thin filf transistors or other devices. Claim 1 reads:
1. A method of fabricating a device layer comprising: a. depositing a layer of nanoparticle ink onto a substrate structure; and b. annealing the nanoparticle ink, wherein nanoparticles from the nanoparticle ink fuse together and wherein the nanoparticles comprise nanoparticles formed by treating a metal monoxide to form a composite material comprising a metal oxide matrix and the nanoparticles embedded therein and isolating the nanoparticles from the composite material.
Use of nanoparticle based ink is an attractive low-cost alternative to optical lithographic processes since it only requires printing methodologies such as inkjet or imprint lithography which present fewer environmental constraints. This patent proposes using annealing of a deposited nanoparticle ink layer in a metal oxide matrix to form doped surface layers for thin filf transistors or other devices. Claim 1 reads:
1. A method of fabricating a device layer comprising: a. depositing a layer of nanoparticle ink onto a substrate structure; and b. annealing the nanoparticle ink, wherein nanoparticles from the nanoparticle ink fuse together and wherein the nanoparticles comprise nanoparticles formed by treating a metal monoxide to form a composite material comprising a metal oxide matrix and the nanoparticles embedded therein and isolating the nanoparticles from the composite material.
posted by blaisemouttet at 11:14 PM
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