US Patent 7951424 - Selective placement of CNTs on oxide surface
In order to mass produce MOSFETs with carbon nanotube material a relaiable method is necessary to pattern the nanotubes. This patent from IBM teaches techniques compatible with microcontact printing. Claim 1 reads:
1. A method of selective placement of carbon nanotubes on a predetermined surface comprising:
selectively placing without utilizing silylation chemistry a self-assembled monolayer on an upper metal oxide surface of a substrate;
depositing carbon nanotubes from a dispersion on said self-assembled monolayer or on a surface of said substrate not containing said self-assembled monolayer; and
removing excess carbon nanotubes from said substrate.