US Patent 7417320 - CNT array patterning using base film
Carbon nanotube patterning often involves the processing of a catalytic film that can damage other areas of a substrate making integration with more conventional electronics difficult. This patent from Fujitsu teaches using a base film to facilitate the patterning to avoid processing of the catalytic film that can cause damage. Claim 1 reads:
1. A substrate structure, comprising:
a base film pattern-formed in a region on said substrate;
a catalyst material deposited on an entire surface on said substrate so as to cover said base film and having a first portion formed on said base film and a second portion formed on said substrate; and
a linear structure made of a carbon element and formed only on a portion corresponding to a portion on said base film of said catalyst material said first portion.